薄膜硅太阳能电池缺陷区的预测与预防

M. Sever, J. Krč, M. Topič
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引用次数: 0

摘要

以前建立的生长模型用于模拟薄膜硅太阳能电池内部缺陷区域的发生。该过程可以通过预测和预防缺陷区域来扩展光学优化,从而使优化的纹理产生高短路电流密度(JSC),同时保持电池的良好电性能。将该方法应用于正弦波和半圆形纹理。所分析的双结薄膜硅太阳能电池的最佳预测情况是周期为1800 nm,高度为900 nm的半圆形结构,其中顶部和底部电池的JSC分别有望提高2%和85%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Prediction and prevention of defective regions within thin-film silicon solar cells
Previously developed growth model is used to simulate occurrence of defective regions within thin-film silicon solar cells. Such procedure enables expansion of optical optimization with prediction and prevention of defective regions, resulting in optimized textures generating high short-circuit current density (JSC) while maintaining good electrical properties of the cell. The approach is applied on sinusoidal and semi-circular texture. Best predicted case for the analysed double junction thin-film silicon solar cell is the semi-circular texture with period of 1800 nm and height of 900 nm, where improvement in JSC of 2 % and 85 % is expected for top and bottom cell, respectively.
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