Goos-Häanchen在手性负折射介质表面的位移

2008 International Workshop on Metamaterials Pub Date : 2008-12-22 DOI:10.1109/META.2008.4723538

W. Dong, L. Gao, C. Qiu

{"title":"Goos-Häanchen在手性负折射介质表面的位移","authors":"W. Dong, L. Gao, C. Qiu","doi":"10.1109/META.2008.4723538","DOIUrl":null,"url":null,"abstract":"The Goos-Hachen (GH) shift at the surface of chiral negative refraction media is analyzed theoretically. GH shifts are observed for both components of the reflected field near the respective critical angles. It is found that the shifts for both components of the reflected field are always positive when angles of incidence are larger than the second critical angle.","PeriodicalId":345360,"journal":{"name":"2008 International Workshop on Metamaterials","volume":"6 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2008-12-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"10","resultStr":"{\"title\":\"Goos-Häanchen shift at the surface of chiral negative refractive media\",\"authors\":\"W. Dong, L. Gao, C. Qiu\",\"doi\":\"10.1109/META.2008.4723538\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The Goos-Hachen (GH) shift at the surface of chiral negative refraction media is analyzed theoretically. GH shifts are observed for both components of the reflected field near the respective critical angles. It is found that the shifts for both components of the reflected field are always positive when angles of incidence are larger than the second critical angle.\",\"PeriodicalId\":345360,\"journal\":{\"name\":\"2008 International Workshop on Metamaterials\",\"volume\":\"6 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2008-12-22\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"10\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2008 International Workshop on Metamaterials\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/META.2008.4723538\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2008 International Workshop on Metamaterials","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/META.2008.4723538","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 10

摘要

对手性负折射介质表面的古斯-哈琴位移进行了理论分析。在各自的临界角附近，观察到反射场的两个分量的GH位移。当入射角大于第二临界角时，反射场的两个分量的位移都是正的。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

查看原文本刊更多论文

Goos-Häanchen shift at the surface of chiral negative refractive media

The Goos-Hachen (GH) shift at the surface of chiral negative refraction media is analyzed theoretically. GH shifts are observed for both components of the reflected field near the respective critical angles. It is found that the shifts for both components of the reflected field are always positive when angles of incidence are larger than the second critical angle.

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

2008 International Workshop on Metamaterials

自引率

0.00%

发文量