高达170 GHz的硅有源和无源器件的片上s参数去嵌入

K. Yau, I. Sarkas, A. Tomkins, P. Chevalier, S. Voinigescu
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引用次数: 39

摘要

本文首次比较了直流至170 GHz范围内硅有源和无源器件的晶片上表征的开短、穿断和TRL去嵌入技术。使用变压器,电容器,65纳米mosfet和SiGe hbt证明,如果开放和短假人被设计为在170GHz内保持集中,那么三种去嵌入技术之间几乎没有区别。针对具有串联接地电感的晶体管测试结构,提出了一种新的TRL +短嵌入方法。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
On-wafer S-parameter de-embedding of silicon active and passive devices up to 170 GHz
This paper compares for the first time open-short, split-through, and TRL de-embedding techniques for on-wafer characterization of silicon active and passive devices in the DC to 170 GHz range. It is demonstrated using transformers, capacitors, 65 nm MOSFETs and SiGe HBTs that, if the open and short dummies are designed to remain lumped through 170GHz, there is almost no difference between the three de-embedding techniques. For transistor test structures with series ground inductance, a new TRL + short de-embedding method is proposed.
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