{"title":"一种干涉图解释方法。","authors":"G. Pinto, G. Vietri","doi":"10.1364/oft.1985.thcc4","DOIUrl":null,"url":null,"abstract":"A method for evaluating the performance of an optical system has been developed. The method is based on a comparison between the actual wavefront as measured at the output of the optical system under test and a simulated wavefront corresponding to the nominal system. In this way information regarding fabrication related defects can be obtained, in other words the difference in performance between the actual system and the nominal system corresponding to the design prescription can be appraised.","PeriodicalId":142307,"journal":{"name":"Optical Fabrication and Testing Workshop","volume":"37 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"A method of interferogram interpretation.\",\"authors\":\"G. Pinto, G. Vietri\",\"doi\":\"10.1364/oft.1985.thcc4\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A method for evaluating the performance of an optical system has been developed. The method is based on a comparison between the actual wavefront as measured at the output of the optical system under test and a simulated wavefront corresponding to the nominal system. In this way information regarding fabrication related defects can be obtained, in other words the difference in performance between the actual system and the nominal system corresponding to the design prescription can be appraised.\",\"PeriodicalId\":142307,\"journal\":{\"name\":\"Optical Fabrication and Testing Workshop\",\"volume\":\"37 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Optical Fabrication and Testing Workshop\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1364/oft.1985.thcc4\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optical Fabrication and Testing Workshop","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/oft.1985.thcc4","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A method for evaluating the performance of an optical system has been developed. The method is based on a comparison between the actual wavefront as measured at the output of the optical system under test and a simulated wavefront corresponding to the nominal system. In this way information regarding fabrication related defects can be obtained, in other words the difference in performance between the actual system and the nominal system corresponding to the design prescription can be appraised.
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