Theodor Hillebrand, Nico Hellwege, N. Heidmann, S. Paul, D. Peters-Drolshagen
{"title":"基于电荷的CMOS电路随机老化分析","authors":"Theodor Hillebrand, Nico Hellwege, N. Heidmann, S. Paul, D. Peters-Drolshagen","doi":"10.1109/IIRW.2015.7437084","DOIUrl":null,"url":null,"abstract":"Scaled down CMOS transistors are prone to degradation and process variation. This necessitates a transistor model that provides an insight into the internal dependencies between these two crucial effects. Models for modern transistors and their degradation behavior are hardly attachable. This paper proposes a modified BSIM6 model which includes degradation due to BTI and HCI and in addition process variations. The application of this method is demonstrated on the basis of a single MOSFET and an inverter stage. The results can be used in the gm/Id work flow or for yield estimation on circuit level.","PeriodicalId":120239,"journal":{"name":"2015 IEEE International Integrated Reliability Workshop (IIRW)","volume":"57 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2015-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":"{\"title\":\"Charge-based stochastic aging analysis of CMOS circuits\",\"authors\":\"Theodor Hillebrand, Nico Hellwege, N. Heidmann, S. Paul, D. Peters-Drolshagen\",\"doi\":\"10.1109/IIRW.2015.7437084\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Scaled down CMOS transistors are prone to degradation and process variation. This necessitates a transistor model that provides an insight into the internal dependencies between these two crucial effects. Models for modern transistors and their degradation behavior are hardly attachable. This paper proposes a modified BSIM6 model which includes degradation due to BTI and HCI and in addition process variations. The application of this method is demonstrated on the basis of a single MOSFET and an inverter stage. The results can be used in the gm/Id work flow or for yield estimation on circuit level.\",\"PeriodicalId\":120239,\"journal\":{\"name\":\"2015 IEEE International Integrated Reliability Workshop (IIRW)\",\"volume\":\"57 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2015-10-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"5\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2015 IEEE International Integrated Reliability Workshop (IIRW)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IIRW.2015.7437084\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2015 IEEE International Integrated Reliability Workshop (IIRW)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IIRW.2015.7437084","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Charge-based stochastic aging analysis of CMOS circuits
Scaled down CMOS transistors are prone to degradation and process variation. This necessitates a transistor model that provides an insight into the internal dependencies between these two crucial effects. Models for modern transistors and their degradation behavior are hardly attachable. This paper proposes a modified BSIM6 model which includes degradation due to BTI and HCI and in addition process variations. The application of this method is demonstrated on the basis of a single MOSFET and an inverter stage. The results can be used in the gm/Id work flow or for yield estimation on circuit level.