一纳米的表面复制。镍电铸工艺的平整平滑度

H. Mimura, S. Matsuyama, Y. Sano, K. Yamauchi
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引用次数: 4

摘要

对于大规模生产纳米尺寸的图案和/或纳米平面,表面复制过程是必要的。我们一直在开发一种表面复制技术,目标是在高度方向上达到1纳米级的复制精度。该工艺以低温镍电铸为基础。为了研究复制精度,我们使用了一个具有0.1 nm平整度均方根(RMS)的EEM(弹性发射加工)加工表面作为主表面,并比较了主表面和复制表面的粗糙度。采用相移显微干涉法和原子力显微镜对表面粗糙度进行了评价。结果表明,在一纳米级别的平滑度上,表面复制是可能的。研究了主表面的耐久性和工艺的可重复性。在多次电铸过程中,主表面的表面质量得到了保证。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Surface replication with one-nanometer.level smoothness by a nickel electroforming process
A surface replication process is necessary for the mass production of nanometer-sized patterned and/or nanometer-flat surfaces. We have been developing a surface replication technique, aiming for 1 nanometer level replication accuracy in height direction. The process is based on nickel electroforming under low-temperature conditions. To investigate replication accuracy, we used an EEM (elastic emission machining) processed surface, having 0.1 nm flatness in root-mean-square (RMS) as a master surface, and compared the roughness of the master and replicated surfaces. The surface roughness is evaluated by using phase-shift microscopic interferometry and atomic force microscopy. The results indicate that surface replication is possible for one-nanometer–level smoothness. The durability of the master surface and repeatability of the process are also investigated. Surface quality of the master surface was found to be maintained during multiple electroforming processes.
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