多层平面Gunn二极管的垂直缩放

N. Pilgrim, A. Khalid, C. Li, G. Dunn, D. Cumming
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引用次数: 1

摘要

通过结合先前成功的GaAs/AlGaAs器件中存在的多个有源epilayer堆叠,平面Gunn二极管已经垂直缩放。将制造器件的结果与使用蒙特卡罗方法模拟的结果进行比较表明,虽然在这种缩放设计中电流和功率输出会增加,但这受到显著加热的限制,这会导致堆叠数量呈亚线性缩放。如果考虑到非缩放设计或缩放器件在低于峰值温度下产生的较高电流,则意味着存在额外的电流限制机制,例如非活动堆叠。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Vertical scaling of multi-stack Planar Gunn diodes
Planar Gunn diodes have been scaled vertically through combining multiple active epilayer stacks present in previously successful GaAs/AlGaAs devices. Comparison of results from fabricated devices with those simulated using a Monte Carlo approach suggest that while current and power output rises in such scaled designs, this is limited by significant heating which results in sub-linear scaling with the number of stacks. The presence of additional current-limiting mechanisms, such as inactive stacks, are implied if considering the higher currents produced by un-scaled designs or scaled devices at below peak temperatures.
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