硅光子平台系统工艺变化的表征

2017 IEEE Optical Interconnects Conference (OI) Pub Date : 2017-06-01 DOI:10.1109/OIC.2017.7965506

Nicholas A. Boynton, A. Pomerene, A. Starbuck, A. Lentine, C. DeRose

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引用次数: 4

摘要

我们对谐振波长变化与工艺变量的相关性进行了定量分析，发现微环谐振波长变化的50%是由系统工艺条件引起的。我们还讨论了通过减轻这些系统变化来改善器件均匀性的问题。

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Characterization of systematic process variation in a silicon photonic platform

We present a quantitative analysis of the correlation of resonant wavelength variation with process variables, and find that 50% of the resonant wavelength variation for microrings is due to systematic process conditions. We also discuss the improvement of device uniformity by mitigating these systematic variations.

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来源期刊

2017 IEEE Optical Interconnects Conference (OI)

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