化学镀镍对纳米多孔氧化铝击穿电压的影响

B. Tzaneva, S. Andreev, A. Zahariev, K. Ruskova
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引用次数: 2

摘要

在各种酸性溶液中形成阳极氧化铝膜,并进一步被Ni和Cu涂层覆盖。对其中一部分进行了再阳极氧化,使其势垒亚层增厚。最终得到印刷电路板状多层结构Al/Al$_{2}O_{3}$/Ni/Cu。在这种情况下,可以清楚地表明,阳极氧化物的击穿电压取决于其整体厚度,屏障子层厚度,金属涂层的可用性,并在一定程度上取决于孔径。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Effect of Electroless Nickel Deposition on the Breakdown Voltage of Nanoporous Aluminium Oxide
Anodic aluminium oxide films were formed in various acidic solutions and further covered by Ni and Cu coatings. Certain of them were reanodized to thicken their barrier sub-layer. As a final outcome, printed circuit boardlike multi-layer structure Al/Al$_{2}O_{3}$/Ni/Cu is produced. In this case, it is clearly demonstrated that the breakdown voltage of anodic oxide depends on its overall thickness, barrier sub-layer thickness, metal coating availability as well as to some extent on pore diameter.
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