采用双角反应离子刻蚀技术制备三维光子晶体

K. Suzuki, S. Takahashi, M. Okano, M. Imada, K. Ishizaki, T. Nakamori, Y. Ota, S. Noda
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引用次数: 0

摘要

利用双角度深度刻蚀技术成功制备了三维光子晶体。此外,在三维晶体上或三维晶体之间结合光发射器已被证明可以增强或抑制发射。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Three-dimensional photonic crystals developed by double-angled reactive-ion etching technique
Three-dimensional photonic crystals are successfully fabricated by a double-angled deep-etching technique. Furthermore, bonding a light emitter onto or between three-dimensional crystals has been shown to enhance or suppress emission.
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