在发射极附近有局部掺杂基极的CMOS双极晶体管,用作磁场传感器

L. Ristić, T. Smy, H. Baltes, I. Filanovsky
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引用次数: 2

摘要

比较研究了一种CMOS横向磁电阻结构和一种在发射极附近局部掺杂基极的新型结构。对于这两种结构都采用了差分方法。结果表明,两个局部掺杂的p/sup +/-条纹限制了电子从发射极向垂直方向的注入,极大地改变了电子从发射极向集电极横向流动的路径。这反过来又导致一个更有效的偏转,通过磁场,电子有助于集电极电流。结果,该装置的磁灵敏度提高了三倍以上。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A CMOS bipolar transistor with a locally doped base in the proximity of the emitter as a magnetic field sensor
A comparative study of a CMOS lateral magnetoresistor structure and a novel structure, with a locally doped base in the proximity of the emitter, is presented. For both structures a differential approach is used. The results indicate that the two locally doped p/sup +/-stripes restrict the injection of electrons from the emitter to the vertical direction, dramatically changing the path of the electrons flowing from the emitter laterally to the collectors. This in turn leads to a more effective deflection, by the magnetic field, of the electrons contributing to the collector current. As a result the magnetic sensitivity of the device is increased by more then three times.<>
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