LP-MOCVD GaInAs/InP异质结构界面缺陷与电学性能的相关性,应用于高性能1.67 /spl mu/m GaInAs/InP PiN光电二极管

M. di Forte-Poisson, C. Brylinski, C. Herbeaux, Y. Androussi, A. Lefebvre, J. di Persio, E. Vassilakis, F. Herrbach, C. Carriere
{"title":"LP-MOCVD GaInAs/InP异质结构界面缺陷与电学性能的相关性,应用于高性能1.67 /spl mu/m GaInAs/InP PiN光电二极管","authors":"M. di Forte-Poisson, C. Brylinski, C. Herbeaux, Y. Androussi, A. Lefebvre, J. di Persio, E. Vassilakis, F. Herrbach, C. Carriere","doi":"10.1109/ICIPRM.1993.380692","DOIUrl":null,"url":null,"abstract":"The authors report on low pressure-metal-organic chemical vapor deposition (LP-MOCVD) growth and the properties of GaInAs/InP double heterostructures grown on InP substrate. Some critical points for the LP-MOCVD process are the quality of the sources and appropriate growth conditions. These critical parameters were investigated together with the effect of different switching sequences from InP to GaInAs on the crystallographic and electrical properties of the direct InP/GaInAs interface. The relationship between crystallographic and electrical properties of GaInAs/InP interfaces is demonstrated. In addition a good correlation between such properties and performance of GaInAs/InP PiN photodiodes was observed.<<ETX>>","PeriodicalId":186256,"journal":{"name":"1993 (5th) International Conference on Indium Phosphide and Related Materials","volume":"32 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1993-04-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Correlation between interfacial defects and electrical properties of LP-MOCVD GaInAs/InP heterostructures, application to high performance 1.67 /spl mu/m GaInAs/InP PiN photodiodes\",\"authors\":\"M. di Forte-Poisson, C. Brylinski, C. Herbeaux, Y. Androussi, A. Lefebvre, J. di Persio, E. Vassilakis, F. Herrbach, C. Carriere\",\"doi\":\"10.1109/ICIPRM.1993.380692\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The authors report on low pressure-metal-organic chemical vapor deposition (LP-MOCVD) growth and the properties of GaInAs/InP double heterostructures grown on InP substrate. Some critical points for the LP-MOCVD process are the quality of the sources and appropriate growth conditions. These critical parameters were investigated together with the effect of different switching sequences from InP to GaInAs on the crystallographic and electrical properties of the direct InP/GaInAs interface. The relationship between crystallographic and electrical properties of GaInAs/InP interfaces is demonstrated. In addition a good correlation between such properties and performance of GaInAs/InP PiN photodiodes was observed.<<ETX>>\",\"PeriodicalId\":186256,\"journal\":{\"name\":\"1993 (5th) International Conference on Indium Phosphide and Related Materials\",\"volume\":\"32 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1993-04-19\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"1993 (5th) International Conference on Indium Phosphide and Related Materials\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICIPRM.1993.380692\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"1993 (5th) International Conference on Indium Phosphide and Related Materials","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICIPRM.1993.380692","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

本文报道了低压金属有机化学气相沉积(LP-MOCVD)生长及其在InP衬底上生长的GaInAs/InP双异质结构的性能。LP-MOCVD工艺的关键在于源的质量和适宜的生长条件。研究了这些关键参数以及从InP到GaInAs的不同开关顺序对直接InP/GaInAs界面的晶体学和电学性能的影响。研究了GaInAs/InP界面的晶体学和电学性能之间的关系。此外,还观察到这些特性与GaInAs/InP PiN光电二极管的性能之间存在良好的相关性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Correlation between interfacial defects and electrical properties of LP-MOCVD GaInAs/InP heterostructures, application to high performance 1.67 /spl mu/m GaInAs/InP PiN photodiodes
The authors report on low pressure-metal-organic chemical vapor deposition (LP-MOCVD) growth and the properties of GaInAs/InP double heterostructures grown on InP substrate. Some critical points for the LP-MOCVD process are the quality of the sources and appropriate growth conditions. These critical parameters were investigated together with the effect of different switching sequences from InP to GaInAs on the crystallographic and electrical properties of the direct InP/GaInAs interface. The relationship between crystallographic and electrical properties of GaInAs/InP interfaces is demonstrated. In addition a good correlation between such properties and performance of GaInAs/InP PiN photodiodes was observed.<>
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