氧化大孔硅层是热效应微系统中有效的隔热材料。

B. Mondal, P. Basu, B. T. Reddy, H. Saha, P. Bhattacharya, C. Roychoudhury
{"title":"氧化大孔硅层是热效应微系统中有效的隔热材料。","authors":"B. Mondal, P. Basu, B. T. Reddy, H. Saha, P. Bhattacharya, C. Roychoudhury","doi":"10.1109/ELECTRO.2009.5441136","DOIUrl":null,"url":null,"abstract":"In this work the process for the realization of Oxidised Macro Porous Silicon (OMPS) layer as a material for thermal isolation has been studied. Macro Porous silicon layers are created by anodisation of P-type (10–20 Ω-cm) silicon with HF and DMF (Dimethylformamide), which are then followed by thermal oxidation in order to find a compromise between higher thermal isolation and good mechanical stability. The morphology of the samples are studied by FESEM. A simple model for determining the thermal conductivity (TC) of the OMPS layer has also been formulated which shows that the TC of OMPS layer are two to three order less than crystalline silicon. Heat distribution of a microheater over the OMPS layer has been simulated by using finite element analysis with ANSYS software which shows the higher degree of thermal isolation and better mechanical strength with OMPS layer compared to conventional methods.","PeriodicalId":149384,"journal":{"name":"2009 International Conference on Emerging Trends in Electronic and Photonic Devices & Systems","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2009-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":"{\"title\":\"Oxidized Macro Porous Silicon layer as an effective material for thermal insulation in thermal effect microsystems.\",\"authors\":\"B. Mondal, P. Basu, B. T. Reddy, H. Saha, P. Bhattacharya, C. Roychoudhury\",\"doi\":\"10.1109/ELECTRO.2009.5441136\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this work the process for the realization of Oxidised Macro Porous Silicon (OMPS) layer as a material for thermal isolation has been studied. Macro Porous silicon layers are created by anodisation of P-type (10–20 Ω-cm) silicon with HF and DMF (Dimethylformamide), which are then followed by thermal oxidation in order to find a compromise between higher thermal isolation and good mechanical stability. The morphology of the samples are studied by FESEM. A simple model for determining the thermal conductivity (TC) of the OMPS layer has also been formulated which shows that the TC of OMPS layer are two to three order less than crystalline silicon. Heat distribution of a microheater over the OMPS layer has been simulated by using finite element analysis with ANSYS software which shows the higher degree of thermal isolation and better mechanical strength with OMPS layer compared to conventional methods.\",\"PeriodicalId\":149384,\"journal\":{\"name\":\"2009 International Conference on Emerging Trends in Electronic and Photonic Devices & Systems\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2009-12-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"5\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2009 International Conference on Emerging Trends in Electronic and Photonic Devices & Systems\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ELECTRO.2009.5441136\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2009 International Conference on Emerging Trends in Electronic and Photonic Devices & Systems","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ELECTRO.2009.5441136","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5

摘要

本文研究了氧化宏观多孔硅(OMPS)层作为热隔离材料的实现过程。通过用HF和DMF(二甲基甲酰胺)阳极氧化p型(10-20 Ω-cm)硅形成宏观多孔硅层,然后进行热氧化,以便在更高的热隔离性和良好的机械稳定性之间找到折衷方案。用FESEM对样品的形貌进行了研究。本文还建立了测定OMPS层热导率(TC)的简单模型,表明OMPS层的热导率比晶体硅低2 ~ 3个数量级。利用ANSYS软件对微加热器在OMPS层上的热分布进行了有限元模拟,结果表明,与常规方法相比,采用OMPS层的微加热器具有更高的热隔离度和更好的机械强度。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Oxidized Macro Porous Silicon layer as an effective material for thermal insulation in thermal effect microsystems.
In this work the process for the realization of Oxidised Macro Porous Silicon (OMPS) layer as a material for thermal isolation has been studied. Macro Porous silicon layers are created by anodisation of P-type (10–20 Ω-cm) silicon with HF and DMF (Dimethylformamide), which are then followed by thermal oxidation in order to find a compromise between higher thermal isolation and good mechanical stability. The morphology of the samples are studied by FESEM. A simple model for determining the thermal conductivity (TC) of the OMPS layer has also been formulated which shows that the TC of OMPS layer are two to three order less than crystalline silicon. Heat distribution of a microheater over the OMPS layer has been simulated by using finite element analysis with ANSYS software which shows the higher degree of thermal isolation and better mechanical strength with OMPS layer compared to conventional methods.
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