248nm紫外准分子激光辐照CaF2窗口损伤的研究

Xi Wang, Yue Hu, Jiacheng Wu, Xin Li, Jingzhen Shao
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摘要

研究紫外准分子激光辐照CaF2窗口的损伤机理具有重要的应用价值。CaF2窗口作为一种重要的光学材料,在紫外光电领域得到了广泛的应用。由于紫外准分子激光具有波长短、光子能量高的优点,高功率准分子激光在精密激光加工和军事领域有着广泛的应用前景。本文进行了248nm紫外准分子激光辐照CaF2窗口的损伤实验。利用光学显微镜观察不同实验条件下辐照斑的损伤特征。通过线性拟合,以零损伤概率计算CaF2窗口的激光诱导损伤阈值。基于损伤点的表面特征,讨论了CaF2窗口的损伤机理。实验结果表明,248nm准分子激光对CaF2窗口的零概率损伤阈值分别为入射面5.6J/cm2和出口面1.1J/cm2。当248nm准分子激光照射CaF2窗口时,其损伤首先发生在出口表面,出口表面的损伤阈值小于入射表面。随着激光通量的逐渐增大,出口表面的损伤呈指数型增长,且损伤程度显著高于入射面。该工作有助于进一步提高CaF2窗口在高功率激光设备中的抗损伤性。为紫外光学材料的选择和应用的优化提供必要的参考。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Study on damage of CaF2 windows irradiated by 248nm ultraviolet excimer laser
It has very important application value to investigate the damage mechanism of CaF2 windows irradiated by ultraviolet excimer laser. As significant optical materials, CaF2 windows have been widely used in the ultraviolet photoelectrical field. Because the ultraviolet excimer laser presents favorable characteristics such as short wavelength and high photon energy, the high power excimer lasers are expected to be widely applied in precision laser machining and military field. In this paper, the experiment on damage in CaF2 windows irradiated by 248nm ultraviolet excimer laser was carried out. The damage characteristics of irradiated spots under different experiment conditions were detected by optical microscope. The laser induced damage thresholds of CaF2 windows were calculated by the zero damage probability through linear fitting. The damage mechanism of CaF2 windows were discussed based on the surface characteristics of damage spots. The experimental results indicated that the damage thresholds of zero probability for the 248nm excimer laser to CaF2 windows were 5.6J/cm2 of the incident surface, and 1.1J/cm2 of the exit surface respectively. When CaF2 windows was irradiated by 248nm excimer laser, its damage first occurred to its exit surface, the damage threshold of exit surface was smaller than that of incident surface. As the laser fluence increased gradually, the damage of exit surface was shown to grow exponential and its degree was significantly higher than that of incident surface. This work is helpful to further improve damage resistance of CaF2 windows in high power laser facility. It can provide the necessary references for selection of ultraviolet optical materials and optimization of application.
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