氢化纳米晶硅薄膜组成的二极管的电输运特性

Ming Liu, H. Dou, Yuliang L. He, Xinliu Jiang
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引用次数: 0

摘要

将纳米硅量子点嵌入非晶硅基体中,制成了二极管。在其I-V曲线上观察到不连续的阶梯。二极管的I-V曲线有两种不同的状态:(1)顺序隧穿状态,电流随负偏置的增加而单调增加;(2)共振隧穿区,电流随负偏置的增加而急剧增加,并出现三个量子阶梯。对这一物理现象提出了定性的解释。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Electrical transport properties of a diode consisting of hydrogenated nanocrystalline silicon film
The diode consisting of nano-silicon quantum dots embedded in an amorphous silicon matrix is fabricated. The discontinuous staircases on its I-V curves are observed. There are two distinct regimes on I-V curves of diode: (1) the sequential tunneling regime, where current increases monotonously with increased negative bias; (2) the resonant tunneling regime, where the current increases dramatically with increased negative bias and three quantum staircases appear. The qualitative explanation of this physical phenomenon is proposed.
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