{"title":"采用高击穿、高fmax多端口堆叠晶体管拓扑结构的75 - 105 GHz开关功率放大器","authors":"K. Datta, H. Hashemi","doi":"10.1109/RFIC.2016.7508312","DOIUrl":null,"url":null,"abstract":"High-breakdown, high-fmax multi-port transistor topologies are presented in this work for realizing high power, highly efficient mm-wave switching power amplifiers at 75-105 GHz. Implemented in a 90nm SiGe BiCMOS process, the proposed active structures comprising of two and three stacked transistors with integrated layout parasitics achieve (fmax, breakdown voltage) of (295 GHz, 8V) and (260 GHz, 11 V) respectively and demonstrate peak (output power, PAE) of (22 dBm, 19%) at 85 GHz and (23.3 dBm, 17%) at 83 GHz respectively. The implemented designs are benchmarked against a 88 GHz 19.5 dBm, 16% PAE W-band Class-E power amplifier using native transistor footprints fabricated in the same 90nm SiGe BiCMOS process. The superior performance of the composite transistor designs highlight the benefit of the proposed approach.","PeriodicalId":163595,"journal":{"name":"2016 IEEE Radio Frequency Integrated Circuits Symposium (RFIC)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-05-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"10","resultStr":"{\"title\":\"75 – 105 GHz switching power amplifiers using high-breakdown, high-fmax multi-port stacked transistor topologies\",\"authors\":\"K. Datta, H. Hashemi\",\"doi\":\"10.1109/RFIC.2016.7508312\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"High-breakdown, high-fmax multi-port transistor topologies are presented in this work for realizing high power, highly efficient mm-wave switching power amplifiers at 75-105 GHz. Implemented in a 90nm SiGe BiCMOS process, the proposed active structures comprising of two and three stacked transistors with integrated layout parasitics achieve (fmax, breakdown voltage) of (295 GHz, 8V) and (260 GHz, 11 V) respectively and demonstrate peak (output power, PAE) of (22 dBm, 19%) at 85 GHz and (23.3 dBm, 17%) at 83 GHz respectively. The implemented designs are benchmarked against a 88 GHz 19.5 dBm, 16% PAE W-band Class-E power amplifier using native transistor footprints fabricated in the same 90nm SiGe BiCMOS process. The superior performance of the composite transistor designs highlight the benefit of the proposed approach.\",\"PeriodicalId\":163595,\"journal\":{\"name\":\"2016 IEEE Radio Frequency Integrated Circuits Symposium (RFIC)\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2016-05-22\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"10\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2016 IEEE Radio Frequency Integrated Circuits Symposium (RFIC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/RFIC.2016.7508312\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 IEEE Radio Frequency Integrated Circuits Symposium (RFIC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/RFIC.2016.7508312","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
75 – 105 GHz switching power amplifiers using high-breakdown, high-fmax multi-port stacked transistor topologies
High-breakdown, high-fmax multi-port transistor topologies are presented in this work for realizing high power, highly efficient mm-wave switching power amplifiers at 75-105 GHz. Implemented in a 90nm SiGe BiCMOS process, the proposed active structures comprising of two and three stacked transistors with integrated layout parasitics achieve (fmax, breakdown voltage) of (295 GHz, 8V) and (260 GHz, 11 V) respectively and demonstrate peak (output power, PAE) of (22 dBm, 19%) at 85 GHz and (23.3 dBm, 17%) at 83 GHz respectively. The implemented designs are benchmarked against a 88 GHz 19.5 dBm, 16% PAE W-band Class-E power amplifier using native transistor footprints fabricated in the same 90nm SiGe BiCMOS process. The superior performance of the composite transistor designs highlight the benefit of the proposed approach.