M. Berkani, S. Lefebvre, G. Rostaing, M. Riccio, A. Irace, R. Ruffilli, P. Dupuy
{"title":"智能电源顶部金属的表面分析:红外热测量和源电位映射","authors":"M. Berkani, S. Lefebvre, G. Rostaing, M. Riccio, A. Irace, R. Ruffilli, P. Dupuy","doi":"10.1109/ISPSD.2016.7520861","DOIUrl":null,"url":null,"abstract":"Reliability of modern power MOSFETs is assessed through accelerated electro-thermal aging tests. Top metallization layer reconstruction is one of the most observed degradation mechanisms in power devices operating under short circuit conditions. Experimental analysis results focused on temperature measurement and source potential mapping during ageing will be presented to corroborate previous results on electrical parameters evolution and to give new tools for health monitoring.","PeriodicalId":411783,"journal":{"name":"2016 28th International Symposium on Power Semiconductor Devices and ICs (ISPSD)","volume":"2 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-06-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Surface analysis of smart power top metal: IR thermal measurement and source potential mapping\",\"authors\":\"M. Berkani, S. Lefebvre, G. Rostaing, M. Riccio, A. Irace, R. Ruffilli, P. Dupuy\",\"doi\":\"10.1109/ISPSD.2016.7520861\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Reliability of modern power MOSFETs is assessed through accelerated electro-thermal aging tests. Top metallization layer reconstruction is one of the most observed degradation mechanisms in power devices operating under short circuit conditions. Experimental analysis results focused on temperature measurement and source potential mapping during ageing will be presented to corroborate previous results on electrical parameters evolution and to give new tools for health monitoring.\",\"PeriodicalId\":411783,\"journal\":{\"name\":\"2016 28th International Symposium on Power Semiconductor Devices and ICs (ISPSD)\",\"volume\":\"2 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2016-06-12\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2016 28th International Symposium on Power Semiconductor Devices and ICs (ISPSD)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISPSD.2016.7520861\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 28th International Symposium on Power Semiconductor Devices and ICs (ISPSD)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISPSD.2016.7520861","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Surface analysis of smart power top metal: IR thermal measurement and source potential mapping
Reliability of modern power MOSFETs is assessed through accelerated electro-thermal aging tests. Top metallization layer reconstruction is one of the most observed degradation mechanisms in power devices operating under short circuit conditions. Experimental analysis results focused on temperature measurement and source potential mapping during ageing will be presented to corroborate previous results on electrical parameters evolution and to give new tools for health monitoring.