{"title":"化学氧化物和钼氧化物叠合膜钝化发射极和后接触硅太阳电池的光伏特性","authors":"Chin-Lung Cheng, C. Liu, Kun-Hung Liao","doi":"10.23919/AM-FPD.2019.8830555","DOIUrl":null,"url":null,"abstract":"Photovoltaic characteristics of passivated emitter and rear contact (PERC) silicon solar cells with chemical and molybdenum oxides stacked thin films were investigated. Chemical oxides were formed by various nitric acid solutions. Molybdenum oxides were performed by thermal evaporation from granules of MoO2 (99.9% purity). The parameters, including the concentration and treated time of nitric acid, were investigated.. Compared with the PERC without chemical oxide, the achievement of a conversion efficiency (CE) improvement of more than 0.6% absolute from 18% to 18.6% in PERCs with chemical oxide formed at 25% for 30 s was explored. The promoted mechanism could be attributed to the large negative Qot in SiOx/MoOx bulk stacked films and low Dit in MoOx/SiOx/Si(100) interface.","PeriodicalId":129222,"journal":{"name":"2019 26th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD)","volume":"50 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Photovoltaic Characteristics of Passivated Emitter and Rear Contact Silicon Solar Cells with Chemical and Molybdenum Oxides Stacked Films\",\"authors\":\"Chin-Lung Cheng, C. Liu, Kun-Hung Liao\",\"doi\":\"10.23919/AM-FPD.2019.8830555\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Photovoltaic characteristics of passivated emitter and rear contact (PERC) silicon solar cells with chemical and molybdenum oxides stacked thin films were investigated. Chemical oxides were formed by various nitric acid solutions. Molybdenum oxides were performed by thermal evaporation from granules of MoO2 (99.9% purity). The parameters, including the concentration and treated time of nitric acid, were investigated.. Compared with the PERC without chemical oxide, the achievement of a conversion efficiency (CE) improvement of more than 0.6% absolute from 18% to 18.6% in PERCs with chemical oxide formed at 25% for 30 s was explored. The promoted mechanism could be attributed to the large negative Qot in SiOx/MoOx bulk stacked films and low Dit in MoOx/SiOx/Si(100) interface.\",\"PeriodicalId\":129222,\"journal\":{\"name\":\"2019 26th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD)\",\"volume\":\"50 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2019-07-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2019 26th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.23919/AM-FPD.2019.8830555\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2019 26th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.23919/AM-FPD.2019.8830555","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Photovoltaic Characteristics of Passivated Emitter and Rear Contact Silicon Solar Cells with Chemical and Molybdenum Oxides Stacked Films
Photovoltaic characteristics of passivated emitter and rear contact (PERC) silicon solar cells with chemical and molybdenum oxides stacked thin films were investigated. Chemical oxides were formed by various nitric acid solutions. Molybdenum oxides were performed by thermal evaporation from granules of MoO2 (99.9% purity). The parameters, including the concentration and treated time of nitric acid, were investigated.. Compared with the PERC without chemical oxide, the achievement of a conversion efficiency (CE) improvement of more than 0.6% absolute from 18% to 18.6% in PERCs with chemical oxide formed at 25% for 30 s was explored. The promoted mechanism could be attributed to the large negative Qot in SiOx/MoOx bulk stacked films and low Dit in MoOx/SiOx/Si(100) interface.