{"title":"低漏极偏压下III-V型氮基modfet的1/f噪声研究","authors":"W. Ho, C. Suryaa, K. Tong","doi":"10.1109/HKEDM.1999.836424","DOIUrl":null,"url":null,"abstract":"Flicker noise in MBE grown III-V nitride MODFETs was characterized from room temperature to 130 K. The voltage noise power spectra, S/sub v/(f), were found to be proportional to 1/f/sup /spl gamma// where /spl gamma/ depends on the device temperature as well as the gate bias. Study of S/sub v/(f) as a function of the biasing condition was conducted in detail and were found to vary as V/sub G//sup 2//(V/sub G/-V/sub T/)/sup /spl beta// where /spl beta/ is a function of temperature. Analyses of the data showed that the noise originated from thermal activation of carriers to localized states in the channel area. The experimental data indicated that number fluctuations was not a major factor in the observed noise. However, more work is needed to determine if surface mobility fluctuations played a key role in the 1/f noise.","PeriodicalId":342844,"journal":{"name":"Proceedings 1999 IEEE Hong Kong Electron Devices Meeting (Cat. No.99TH8458)","volume":"290 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Study of 1/f noise in III-V nitride based MODFETs at low drain bias\",\"authors\":\"W. Ho, C. Suryaa, K. Tong\",\"doi\":\"10.1109/HKEDM.1999.836424\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Flicker noise in MBE grown III-V nitride MODFETs was characterized from room temperature to 130 K. The voltage noise power spectra, S/sub v/(f), were found to be proportional to 1/f/sup /spl gamma// where /spl gamma/ depends on the device temperature as well as the gate bias. Study of S/sub v/(f) as a function of the biasing condition was conducted in detail and were found to vary as V/sub G//sup 2//(V/sub G/-V/sub T/)/sup /spl beta// where /spl beta/ is a function of temperature. Analyses of the data showed that the noise originated from thermal activation of carriers to localized states in the channel area. The experimental data indicated that number fluctuations was not a major factor in the observed noise. However, more work is needed to determine if surface mobility fluctuations played a key role in the 1/f noise.\",\"PeriodicalId\":342844,\"journal\":{\"name\":\"Proceedings 1999 IEEE Hong Kong Electron Devices Meeting (Cat. No.99TH8458)\",\"volume\":\"290 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings 1999 IEEE Hong Kong Electron Devices Meeting (Cat. No.99TH8458)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/HKEDM.1999.836424\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings 1999 IEEE Hong Kong Electron Devices Meeting (Cat. No.99TH8458)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/HKEDM.1999.836424","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
摘要
在室温至130 K范围内对MBE生长的III-V型氮化modfet的闪烁噪声进行了表征。电压噪声功率谱S/sub v/(f)与1/f/sup /spl gamma//成正比,其中/spl gamma/取决于器件温度和栅极偏置。对S/sub v/(f)作为偏倚条件的函数进行了详细的研究,发现其变化为v/ sub G//sup 2//(v/ sub G/-V/sub T/)/sup /spl beta//,其中/spl beta/是温度的函数。数据分析表明,噪声来源于载流子在信道区域的局部化状态的热激活。实验数据表明,数字波动不是观测噪声的主要因素。然而,需要做更多的工作来确定表面迁移率波动是否在1/f噪声中起关键作用。
Study of 1/f noise in III-V nitride based MODFETs at low drain bias
Flicker noise in MBE grown III-V nitride MODFETs was characterized from room temperature to 130 K. The voltage noise power spectra, S/sub v/(f), were found to be proportional to 1/f/sup /spl gamma// where /spl gamma/ depends on the device temperature as well as the gate bias. Study of S/sub v/(f) as a function of the biasing condition was conducted in detail and were found to vary as V/sub G//sup 2//(V/sub G/-V/sub T/)/sup /spl beta// where /spl beta/ is a function of temperature. Analyses of the data showed that the noise originated from thermal activation of carriers to localized states in the channel area. The experimental data indicated that number fluctuations was not a major factor in the observed noise. However, more work is needed to determine if surface mobility fluctuations played a key role in the 1/f noise.