GaAs mesfet的产生-复合噪声特性

M. Iqbal, S. Khan
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引用次数: 0

摘要

使用MESFET器件在不同频率和温度范围下进行低频噪声测量。在欧姆区获得的光谱是由于几个1/f和产生复合(g-r)噪声成分。这种方法可以作为一种诊断工具来模拟时变过程的性质,并揭示深层陷阱的位置。检测到不同的陷阱电平,漏极/栅极电流噪声被认为是MESFET质量的良好指标。该理论预测了实验观察到的g-r噪声对栅极和漏极电压的依赖趋势。器件的结构以及构成器件的材料都会影响陷阱的性能
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Generation-recombination noise characteristics of GaAs MESFETs
Low frequency noise measurements were carried out using MESFET devices at different frequency and temperature ranges. The spectra obtained in the ohmic regime are due to several 1/f and generation-recombination (g-r) noise components. This method can be used as a diagnostic tool to model the nature of the time varying process and to uncover the location of the deep traps. Different trap levels were detected and the drain/gate current noise suggested as good indicators of quality of a MESFET. The theory predicts the experimentally observed trend of g-r noise dependence on both gate and drain voltages. The device structure as well as the materials from which it is composed influenced the properties of traps
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