实现40gb /s电时分多路光传输系统

E. Gotwald, A. Felder, H.-M. Reinz, M. Moller, M. Wurzer, B. Stegmuller, M. Plihal, J. Bauer, F. Au
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引用次数: 12

摘要

未来对极高数据速率系统的需求将受到满足日益增长的通信量需求的制约。我们目前的项目目标是在1998年为40 Gb/s TDM光传输系统进行演示,该系统的电子元件基于Si和SiGe双极实验室技术,使用0.6 /spl μ m光刻。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Towards a 40 Gb/s electrical time division multiplexed optical transmission system
The future demand for extremely high data rate systems will be governed by the need to accommodate increasing traffic. The goal of our current project is a demonstrator for a 40 Gb/s TDM optical transmission system in 1998, whose electrical components are based on a Si and SiGe bipolar laboratory technologies using 0.6 /spl mu/m lithography.
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