多层氮化硼(BN)层间相互作用、层序和层数相关结构和电子性质的第一性原理研究

Sintayehu Mekonnen Hailemariam
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引用次数: 0

摘要

层状氮化硼(BN)由共价面内键和层间范德华相互作用组成。本研究利用密度泛函理论(DFT)研究了多层BN的堆叠顺序、层间相互作用和层数相关的结构和电子性质。计算了不同层间距和层数下的晶格常数、平衡层间距和能带结构。计算结果表明,层间相互作用和多层极限下的堆叠顺序会影响其结构和电子性能。此外,计算出的层数增加时的能带结构表明,随着层数的增加,带隙减小。然而,带隙的性质仍然是直接的。此外,偏态密度(PDOS)分析表明,费米能级附近的态主要来自硼p轨道,其次是氮p轨道。这些发现为实验人员通过控制层状材料的堆叠模式和层数来控制层状材料的结构和电子特性提供了基础。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
First Principle Investigation of Interlayer Interaction, Stacking Order and Layer Number Dependent Structural and Electronic Properties of Multi-Layered Boron Nitride (BN)
Layered Boron-Nitride (BN) consist of covalent in-plane bonding with van der Waals (vdW) interlayer interactions between layers. In this study, stacking order, interlayer-interaction and layer number dependent structural and electronic properties of multi-layered BN were studied using Density Functional Theory (DFT). The lattice constant, equilibrium interlayer distance and energy band structures for different interlayer distances and the number of layers were computed. The calculated result indicates that interlayer interaction and stacking order in a multi-layer limit could impact on its structural and electronic properties. In addition to this, the calculated energy band structure for the increasing number of layers indicates that as the number of layers increases the bandgap decreases. However, the nature of the bandgap remains direct. Moreover, the Partial Density of State (PDOS) analysis reveals that many contributions of states in the vicinity of Fermi level derived from Boron p-orbital followed by nitrogen p-orbital. The findings are bases for experimentalist to control structural and electronic properties of layered materials by manipulating its stacking patterns and layer numbers.
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