超导电子学用Ho-Ba-Cu-O薄膜

Stephen J. McCoy, E. Cho, Hao Li, S. Cybart
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引用次数: 1

摘要

采用反应溅射法在SrTiO3 (STO)、(LaAlO3)0.3(Sr2 TaAlO6)0.7 (LSAT)和NdGaO3 (NGO)衬底上生长HoBa2Cu3O7-δ (HBCO)薄膜,以优化超导电子器件的电学性能。通过改变沉积温度和氧分压,我们能够获得临界温度为92 K、临界电流密度为3 MA/cm2的薄膜。采用聚焦氦离子束辐照制备了HBCO Josephson结,该结具有优异的性能。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Ho-Ba-Cu-O Thin Films for Superconductive Electronics
HoBa2Cu3O7-δ (HBCO) thin films were grown by reactive sputtering on SrTiO3 (STO), (LaAlO3)0.3(Sr2 TaAlO6)0.7 (LSAT), and NdGaO3 (NGO) substrates for optimization of electrical properties for superconductive electronics. By changing deposition temperature and oxygen partial pressures we were able to obtain films with critical temperatures of 92 K and critical current density of 3 MA/cm2. HBCO Josephson junctions were fabricated using focused helium ion beam irradiation that exhibited excellent properties.
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