约束对III-V纳米线场效应晶体管的影响

A. Price, A. Martinez
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引用次数: 0

摘要

利用量子输运模拟研究了不同尺寸GaAs和InGaAs栅极全能(GAA)纳米线场效应晶体管(nwfet)中的约束效应。模拟了2.2x2.2 nm2和4.2x4.2 nm2两种横截面和6 nm、10 nm和20 nm三种通道长度的nwfet。采用了有效质量近似(EMA)中的非平衡格林函数(NEGF)形式,并考虑了弹道输运和耗散输运。包括声子、光学声子和极性光学声子的散射机制。有效质量已从紧密结合(TB)模拟中提取出来。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Effect of confinement in III-V nanowire field effect transistors
Using quantum transport simulations the effect of confinement in GaAs and InGaAs gate-all-around (GAA) nanowire field effect transistors (NWFETs) of different dimensions has been investigated. NWFETs of two cross-sections: 2.2x2.2 nm2 and 4.2x4.2 nm2 and three channel lengths: 6 nm, 10 nm and 20 nm have been simulated. The Non-Equilibrium Green's Function (NEGF) formalism in the effective mass approximation (EMA) has been used, and both ballistic and dissipative transport have been considered. Scattering mechanisms for acoustic, optical and polar optical phonons have been included. The effective masses have been extracted from tight-binding (TB) simulations.
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