用蒙特卡罗方法研究场发射体

Ze Niu, M. Zhu, E. Bellotti
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引用次数: 0

摘要

采用基于粒子的蒙特卡罗建模方法研究了硅场发射极器件的特性。我们使用基于四面体元素的非结构化网格来描述器件的三维几何形状,并且在跟踪两个区域中的电子时,我们将硅和真空同等对待。通过评价单场发射硅柱的电流-电压特性,比较了几种隧道模型。然后,我们进行了初步的模型验证,将模拟的电流电压特性与门控硅场发射极的实测值进行了比较。此外,我们将模拟扩展到场发射极阵列(FEAs),以研究相邻发射极的屏蔽效应。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Study of Field Emitters Using Monte Carlo Method
Using a particle-based Monte Carlo modeling approach we study the characteristics of silicon field emitter devices. We use an unstructured mesh based on tetrahedral elements to describe the device geometry in three dimensions, and we treat silicon and vacuum on equal footing when tracking electrons in both regions. We compare several tunnel models by evaluating the current-voltage characteristics of a single field emitting silicon pillar. Then, we perform an initial model validation, comparing the simulated current-voltage characteristic the measured values for a gated silicon field emitter. Furthermore, we extend our simulation to field emitter arrays (FEAs) to study the screen effect for adjacent emitters.
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