新颖的BiCMOS兼容,短通道LDMOS技术中压射频和电源应用

A. Litwin, O. Bengtsson, J. Olsson
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引用次数: 1

摘要

我们描述了一个非常短的通道,0.15 /spl mu/m, LDMOS晶体管,击穿电压高达45 V,在标准的0.35 /spl mu/m BiCMOS工艺中制造。在1900 MHz和12 V电源电压下,0.4 mm栅极宽度器件提供100 mW输出功率P/sub 1 dB/,漏极效率为43%。它的换能器功率增益超过20 dB,电流增益截止频率f/sub /为13 GHz。最大可用增益截止频率f/sub MAX/为27 GHz。LDMOS工艺模块不影响其他设备的性能和型号。我们首次提出了一种简单的方法来创建用于射频功率放大器的高压,高性能LDMOS晶体管,即使在非常缩小的硅技术中也是如此。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Novel BiCMOS compatible, short channel LDMOS technology for medium voltage RF & power applications
We describe a very short channel, 0.15 /spl mu/m, LDMOS transistor, with a breakdown voltage of up to 45 V, manufactured in a standard 0.35 /spl mu/m BiCMOS process. At 1900 MHz and a 12 V supply voltage the 0.4 mm gate width device gives 100 mW output power P/sub 1 dB/ at a drain efficiency of 43%. It has a transducer power gain of more than 20 dB and a current gain cutoff frequency, f/sub T/, of 13 GHz. The maximum available gain cutoff frequency, f/sub MAX/ is 27 GHz. The LDMOS process module does not affect the performance or models of other devices. We present for the first time a simple way to create high voltage, high performance LDMOS transistors for RF power amplifier use even in a very downscaled silicon technology.
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