{"title":"新颖的BiCMOS兼容,短通道LDMOS技术中压射频和电源应用","authors":"A. Litwin, O. Bengtsson, J. Olsson","doi":"10.1109/rfic.2002.1012051","DOIUrl":null,"url":null,"abstract":"We describe a very short channel, 0.15 /spl mu/m, LDMOS transistor, with a breakdown voltage of up to 45 V, manufactured in a standard 0.35 /spl mu/m BiCMOS process. At 1900 MHz and a 12 V supply voltage the 0.4 mm gate width device gives 100 mW output power P/sub 1 dB/ at a drain efficiency of 43%. It has a transducer power gain of more than 20 dB and a current gain cutoff frequency, f/sub T/, of 13 GHz. The maximum available gain cutoff frequency, f/sub MAX/ is 27 GHz. The LDMOS process module does not affect the performance or models of other devices. We present for the first time a simple way to create high voltage, high performance LDMOS transistors for RF power amplifier use even in a very downscaled silicon technology.","PeriodicalId":299621,"journal":{"name":"2002 IEEE Radio Frequency Integrated Circuits (RFIC) Symposium. Digest of Papers (Cat. No.02CH37280)","volume":"5 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Novel BiCMOS compatible, short channel LDMOS technology for medium voltage RF & power applications\",\"authors\":\"A. Litwin, O. Bengtsson, J. Olsson\",\"doi\":\"10.1109/rfic.2002.1012051\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We describe a very short channel, 0.15 /spl mu/m, LDMOS transistor, with a breakdown voltage of up to 45 V, manufactured in a standard 0.35 /spl mu/m BiCMOS process. At 1900 MHz and a 12 V supply voltage the 0.4 mm gate width device gives 100 mW output power P/sub 1 dB/ at a drain efficiency of 43%. It has a transducer power gain of more than 20 dB and a current gain cutoff frequency, f/sub T/, of 13 GHz. The maximum available gain cutoff frequency, f/sub MAX/ is 27 GHz. The LDMOS process module does not affect the performance or models of other devices. We present for the first time a simple way to create high voltage, high performance LDMOS transistors for RF power amplifier use even in a very downscaled silicon technology.\",\"PeriodicalId\":299621,\"journal\":{\"name\":\"2002 IEEE Radio Frequency Integrated Circuits (RFIC) Symposium. Digest of Papers (Cat. No.02CH37280)\",\"volume\":\"5 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2002 IEEE Radio Frequency Integrated Circuits (RFIC) Symposium. Digest of Papers (Cat. No.02CH37280)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/rfic.2002.1012051\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2002 IEEE Radio Frequency Integrated Circuits (RFIC) Symposium. Digest of Papers (Cat. No.02CH37280)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/rfic.2002.1012051","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Novel BiCMOS compatible, short channel LDMOS technology for medium voltage RF & power applications
We describe a very short channel, 0.15 /spl mu/m, LDMOS transistor, with a breakdown voltage of up to 45 V, manufactured in a standard 0.35 /spl mu/m BiCMOS process. At 1900 MHz and a 12 V supply voltage the 0.4 mm gate width device gives 100 mW output power P/sub 1 dB/ at a drain efficiency of 43%. It has a transducer power gain of more than 20 dB and a current gain cutoff frequency, f/sub T/, of 13 GHz. The maximum available gain cutoff frequency, f/sub MAX/ is 27 GHz. The LDMOS process module does not affect the performance or models of other devices. We present for the first time a simple way to create high voltage, high performance LDMOS transistors for RF power amplifier use even in a very downscaled silicon technology.