压缩氧化基RRAM保留尾抑制的编程条件解决方案

C. Y. Chen, A. Fantini, L. Goux, R. Degraeve, S. Clima, A. Redolfi, Guido Groeseneken, M. Jurczak
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引用次数: 23

摘要

我们研究了脉冲编程条件对40nm × 40nm TiN\HfO2\Hf RRAM器件数据保留的影响,重点研究了尾位的失效。我们证明了保留损失尾位不是由于丝成分的外扩散,而是由于低活化能(Ea~0.5eV)扩散物质,这些物质被理解为导电丝收缩附近的亚稳氧(O)离子。为了最大限度地减少它们的影响,证明了有效的编程途径,因为通过(i)使用更长的Write脉冲而不是更高的电流脉冲幅度,和/或通过(ii)在Write set之前使用更短的复位脉冲,可以更好地减少低ea人口。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Programming-conditions solutions towards suppression of retention tails of scaled oxide-based RRAM
We investigate the impact of pulse programming conditions on data-retention of 40nm × 40nm TiN\HfO2\Hf RRAM devices, focusing on the failure of tail bits. We demonstrate that retention loss tail bit is not due to out diffusion of filament constituents but by low activation-energy (Ea~0.5eV) diffusing species, which are understood as metastable Oxygen (O)-ions in the neighborhood of the conductive-filament constriction. In order to minimize their impact, effective programming pathways are demonstrated, as the low-Ea population is better reduced by (i) using longer Write pulses rather than higher current-pulse amplitudes, and/or by (ii) using shorter reset pulse prior to Write set.
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