边缘照明相衬成像中的平场分析

Ben Huyge, Jonathan G. Sanctorum, Nathanael Six, J. D. Beenhouwer, Jan Sijbers
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引用次数: 2

摘要

x射线成像中最常用的校正方法之一是平场校正,它校正系统的不一致性,例如探测器像素响应的差异。在传统的x射线成像中,通过在x射线束中不暴露任何物体的探测器来获得平坦场。然而,在边缘照明x射线CT中,这是一种新兴的相衬成像技术,使用两个掩模来测量x射线的折射。当获得平场时,这些掩模仍然存在,从而影响平场的强度。对这种影响进行了理论研究,并通过GATE的边缘照明实验蒙特卡罗模拟进行了实验验证。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Analysis Of Flat Fields In Edge Illumination Phase Contrast Imaging
One of the most commonly used correction methods in X-ray imaging is flat field correction, which corrects for systematic inconsistencies, such as differences in detector pixel response. In conventional X-ray imaging, flat fields are acquired by exposing the detector without any object in the X-ray beam. However, in edge illumination X-ray CT, which is an emerging phase contrast imaging technique, two masks are used to measure the refraction of the X-rays. These masks remain in place while the flat fields are acquired and thus influence the intensity of the flat fields. This influence is studied theoretically and validated experimentally using Monte Carlo simulations of an edge illumination experiment in GATE.
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