作为高效热电材料的超尺度硅纳米线

E. Ramayya, I. Knezevic
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引用次数: 8

摘要

在考虑电子和声子二维约束的情况下,通过求解电子和声子玻尔兹曼输运方程,计算了高掺杂方形截面硅纳米线的室温热电优值(ZT)。SiNWs中的ZT几乎比体硅的ZT大两个数量级。在SiNWs中,ZT的增强主要是由于强声子边界散射导致晶格热导率比在体硅中降低了约两个数量级。随着导线截面的减小,电导率(sigma)和导热系数(k)减小,塞贝克系数(S)增大。因此,ZT随横截面的变化是非单调的,当横截面为4 × 4 nm时ZT最大。边界粗糙度散射确实对SiNWs中的电子输运和热输运都有显著的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Ultrascaled Silicon Nanowires as Efficient Thermoelectric Materials
The room-temperature thermoelectric figure of merit (ZT) of highly doped silicon nanowires (SiNWs) of square cross section was calculated by solving the electron and phonon Boltzmann transport equations with a proper account of the two dimensional confinement of both electrons and phonons. The ZT in SiNWs is almost two orders of magnitude larger than that of bulk silicon. The enhancement of ZT in SiNWs occurs primarily because of strong phonon-boundary scattering that degrades the lattice thermal conductivity by about two orders of magnitude from its value in bulk silicon. With decreasing wire cross section, the electrical conductivity (sigma) and thermal conductivity (k) decrease, whereas the Seebeck coefficient (S) increases. Therefore, the ZT variation with cross section is nonmonotonic, with ZT maximal for a wire of cross section 4 times 4 nm 2 . Boundary roughness scattering indeed proves to have a significant effect on both electronic and thermal transport in SiNWs.
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