高压无漂移4H-SiC p-i-n二极管的最新进展

M. Das, J. Sumakeris, S. Krishnaswami, M. Paisley, A. Agarwal, A. Powell
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引用次数: 9

摘要

作为大功率整流器,4H-SiC引脚二极管是一个有吸引力的选择。4H-SiC材料技术的进步使得高功率PiN二极管的实现成为可能。为了制备PiN二极管,在导电4HN SiC衬底上生长了氮掺杂薄膜。堆叠故障会影响设备性能。说明了阻塞性能、正向和反向特性。通过施加恒定的正向电流密度,对这些器件进行了长期正向电压稳定性测量。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Latest advances in high voltage, drift free 4H-SiC p-i-n diodes
The 4H-SiC PiN diode is an attractive choice as a high power rectifier. 4H-SiC material technology has advanced to allow the realization of high power PiN diodes. In order to fabricate PiN diodes, nitrogen doped epilayers were grown on conducting 4HN SiC substrates. Stacking fault affect the device performance. Blocking capability, forward and reverse characteristics are explained. Long term forward voltage stability measurements were made on these devices by applying a constant forward current density.
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