{"title":"TFT技术及其在FED中的应用","authors":"Jin Jang","doi":"10.1109/IVNC.2006.335374","DOIUrl":null,"url":null,"abstract":"The TFT technologies with amorphous silicon, polycrystalline silicon and organic semiconductor will be presented together with the current issues for display applications. Active-matrix technologies are being used for manufacturing of TFT-LCD and TFT-OLED because of their advantages in realizing high performance displays. The advantages and disadvantages of active-matrix technologies for FED were discussed and a prototype AMFED using a high temperature processed amorphous silicon TFT on glass was presented","PeriodicalId":108834,"journal":{"name":"2006 19th International Vacuum Nanoelectronics Conference","volume":"14 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"TFT Technologies and Its Application to FED\",\"authors\":\"Jin Jang\",\"doi\":\"10.1109/IVNC.2006.335374\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The TFT technologies with amorphous silicon, polycrystalline silicon and organic semiconductor will be presented together with the current issues for display applications. Active-matrix technologies are being used for manufacturing of TFT-LCD and TFT-OLED because of their advantages in realizing high performance displays. The advantages and disadvantages of active-matrix technologies for FED were discussed and a prototype AMFED using a high temperature processed amorphous silicon TFT on glass was presented\",\"PeriodicalId\":108834,\"journal\":{\"name\":\"2006 19th International Vacuum Nanoelectronics Conference\",\"volume\":\"14 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2006-07-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2006 19th International Vacuum Nanoelectronics Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IVNC.2006.335374\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2006 19th International Vacuum Nanoelectronics Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IVNC.2006.335374","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
The TFT technologies with amorphous silicon, polycrystalline silicon and organic semiconductor will be presented together with the current issues for display applications. Active-matrix technologies are being used for manufacturing of TFT-LCD and TFT-OLED because of their advantages in realizing high performance displays. The advantages and disadvantages of active-matrix technologies for FED were discussed and a prototype AMFED using a high temperature processed amorphous silicon TFT on glass was presented
求助内容：
应助结果提醒方式：
京公网安备 11010802042870号
