技术扩展对dram性能的影响

S. Sharroush
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引用次数: 4

摘要

毫无疑问,CMOS技术的缩放会显著影响单晶体管单电容动态随机存取存储器(1T-1C dram)的性能。本文定性地探讨了CMOS技术的缩放、晶体管和电容的制造工艺的变化对dram性能的影响。作为评价DRAM性能的标准的指标是芯片面积、功耗、周期时间和感知余量。仿真结果证实了这种影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Impact of technology scaling on the performance of DRAMs
There is no doubt that the CMOS technology scaling affects significantly the performance of the one-transistor one capacitor dynamic-random access memories (1T-1C DRAMs). In this paper, the effect of CMOS technology scaling and the change of the fabrication techniques of the access transistor and the cell-storage capacitor on the performance of DRAMs are investigated and discussed qualitatively. The metrics that are taken as the criteria for evaluating the performance of the DRAM are the chip area, the power consumption, the cycle time, and the sense margin. The simulation results ascertain this impact.
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