重新评估3D堆叠存储器的延迟要求

D. W. Chang, Gyungsu Byun, Hoyoung Kim, Minwook Ahn, Soojung Ryu, N. Kim, M. Schulte
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引用次数: 25

摘要

近年来,3D技术已经成为一个受欢迎的研究领域,它使研究人员能够探索许多新颖的计算机体系结构。其中一个比较流行的话题是将3D主存芯片集成在计算芯片下面,并通过硅通孔(tsv)将它们连接起来。这可以将片外主存储器访问延迟减少大约45%到60%。然而,我们详细的电路级模型表明,tsv的延迟减少要少得多。在本文中,我们提出了这些模型,比较了2D和3D主存的延迟,并表明使用3D主存的延迟减少不超过2.4 ns。我们还表明,尽管使用tsv启用的更宽的I/O总线宽度可以提高性能,但它可能会增加功耗。虽然tsv每比特传输消耗的功率比片外金属互连少(每比特传输功率少11.2倍),但tsv通常使用更多的比特,并且由于内存I/O总线中有大量比特,可能导致净功率增加。我们的分析表明,尽管利用更宽内存总线的3D内存层次结构可以提高性能,但这种性能提高可能无法证明功耗的净增加是合理的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Reevaluating the latency claims of 3D stacked memories
In recent years, 3D technology has been a popular area of study that has allowed researchers to explore a number of novel computer architectures. One of the more popular topics is that of integrating 3D main memory dies below the computing die and connecting them with through-silicon vias (TSVs). This is assumed to reduce off-chip main memory access latencies by roughly 45% to 60%. Our detailed circuit-level models, however, demonstrate that this latency reduction from the TSVs is significantly less. In this paper, we present these models, compare 2D and 3D main memory latencies, and show that the reduction in latency from using 3D main memory to be no more than 2.4 ns. We also show that although the wider I/O bus width enabled by using TSVs increases performance, it may do so with an increase in power consumption. Although TSVs consume less power per bit transfer than off-chip metal interconnects (11.2 times less power per bit transfer), TSVs typically use considerably more bits and may result in a net increase in power due to the large number of bits in the memory I/O bus. Our analysis shows that although a 3D memory hierarchy exploiting a wider memory bus can increase performance, this performance increase may not justify the net increase in power consumption.
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