用羰基二烯前驱体在低温脉冲CVD条件下生长钌薄膜

2009 International School and Seminar on Modern Problems of Nanoelectronics, Micro- and Nanosystem Technologies Pub Date : 2009-11-13 DOI:10.1109/INTERNANO.2009.5335628

V. Vasilyev

{"title":"用羰基二烯前驱体在低温脉冲CVD条件下生长钌薄膜","authors":"V. Vasilyev","doi":"10.1109/INTERNANO.2009.5335628","DOIUrl":null,"url":null,"abstract":"This paper is devoted to the investigation of the ruthenium films, chemically vapor deposited under low temperature and sequentially pulsed gas injection conditions. Experimental results presented and published in 2006–2008 have been briefly consolidated. This paper can be interesting to those working in modern precision technologies as well as postgraduate students.","PeriodicalId":376370,"journal":{"name":"2009 International School and Seminar on Modern Problems of Nanoelectronics, Micro- and Nanosystem Technologies","volume":"110 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2009-11-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Ruthenium thin film growth under low temperature pulsed CVD conditions Using carbonyl-diene precursor\",\"authors\":\"V. Vasilyev\",\"doi\":\"10.1109/INTERNANO.2009.5335628\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper is devoted to the investigation of the ruthenium films, chemically vapor deposited under low temperature and sequentially pulsed gas injection conditions. Experimental results presented and published in 2006–2008 have been briefly consolidated. This paper can be interesting to those working in modern precision technologies as well as postgraduate students.\",\"PeriodicalId\":376370,\"journal\":{\"name\":\"2009 International School and Seminar on Modern Problems of Nanoelectronics, Micro- and Nanosystem Technologies\",\"volume\":\"110 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2009-11-13\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2009 International School and Seminar on Modern Problems of Nanoelectronics, Micro- and Nanosystem Technologies\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/INTERNANO.2009.5335628\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2009 International School and Seminar on Modern Problems of Nanoelectronics, Micro- and Nanosystem Technologies","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/INTERNANO.2009.5335628","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 0

摘要

本文研究了在低温连续脉冲注气条件下化学气相沉积钌薄膜。在2006-2008年提出和发表的实验结果已简要合并。这篇论文对于从事现代精密技术工作的人以及研究生来说是很有趣的。

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Ruthenium thin film growth under low temperature pulsed CVD conditions Using carbonyl-diene precursor

This paper is devoted to the investigation of the ruthenium films, chemically vapor deposited under low temperature and sequentially pulsed gas injection conditions. Experimental results presented and published in 2006–2008 have been briefly consolidated. This paper can be interesting to those working in modern precision technologies as well as postgraduate students.

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来源期刊

2009 International School and Seminar on Modern Problems of Nanoelectronics, Micro- and Nanosystem Technologies

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