{"title":"软x射线史瓦西光学的多层性能","authors":"G. Gutman, K. Parker, J. Wood, R. Watts","doi":"10.1364/sxray.1992.tub4","DOIUrl":null,"url":null,"abstract":"One of the most important requirements for soft x-ray optics is high normal incidence reflectivity. But to ensure a high throughput optical system, Schwarzchild objectives in particular, it is not only necessary to fabricate multilayer coatings with the highest possible reflectivity but to achieve the designed d-spacing uniformity/grading and match the d-spacings of the concave and convex mirrors. The latter is especially important for high throughput multi-mirror lithography optical schemes.[1]","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"44 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Multilayer Performance for Soft X-ray Schwarzchild Optics\",\"authors\":\"G. Gutman, K. Parker, J. Wood, R. Watts\",\"doi\":\"10.1364/sxray.1992.tub4\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"One of the most important requirements for soft x-ray optics is high normal incidence reflectivity. But to ensure a high throughput optical system, Schwarzchild objectives in particular, it is not only necessary to fabricate multilayer coatings with the highest possible reflectivity but to achieve the designed d-spacing uniformity/grading and match the d-spacings of the concave and convex mirrors. The latter is especially important for high throughput multi-mirror lithography optical schemes.[1]\",\"PeriodicalId\":409291,\"journal\":{\"name\":\"Soft-X-Ray Projection Lithography\",\"volume\":\"44 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Soft-X-Ray Projection Lithography\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1364/sxray.1992.tub4\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Soft-X-Ray Projection Lithography","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/sxray.1992.tub4","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Multilayer Performance for Soft X-ray Schwarzchild Optics
One of the most important requirements for soft x-ray optics is high normal incidence reflectivity. But to ensure a high throughput optical system, Schwarzchild objectives in particular, it is not only necessary to fabricate multilayer coatings with the highest possible reflectivity but to achieve the designed d-spacing uniformity/grading and match the d-spacings of the concave and convex mirrors. The latter is especially important for high throughput multi-mirror lithography optical schemes.[1]
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