直方图特征的二次chi相似度度量学习

Xinyuan Cai, Baihua Xiao, Chunheng Wang, Rongguo Zhang
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引用次数: 2

摘要

直方图特征在现代计算机视觉算法中得到了广泛的应用,如SIFT、HOG、LBP等。根据[18],卡方距离是比较直方图特征的有效度量。在本文中,我们提出了一种新的直方图特征的相似度度量学习(QCSML)方法。本文的主要贡献在于,与传统的马氏距离度量学习方法相比,我们提出了一种新的基于卡方距离的度量学习方法。在我们的方法中使用二次chi相似度导致了一个有效的学习算法。我们的方法在SIFT特征上进行了人脸识别测试,并在基准数据集Labeled Faces in the Wild (LFW)上与最先进的度量学习方法(LDML)进行了比较。实验结果表明,与LDML相比,我们的方法可以获得明显的性能提升。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Quadratic-chi similarity metric learning for histogram feature
Histogram features, such as SIFT, HOG, LBP et al, are widely used in modern computer vision algorithms. According to [18], chi-square distance is an effective measure for comparing histogram features. In this paper, we propose a new method, named the Quadric-chi similarity metric learning (QCSML) for histogram features. The main contribution of this paper is that we propose a new metric learning method based on chi-square distance, in contrast with traditional Mahalanobis distance metric learning methods. The use of quadric-chi similarity in our method leads to an effective learning algorithm. Our method is tested on SIFT features for face identification, and compared with the state-of-art metric learning method (LDML) on the benchmark dataset, the Labeled Faces in the Wild (LFW). Experimental results show that our method can achieve clear performance gains over LDML.
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