高精度电阻梯式测试结构的设计与表征

Proceedings of the 2002 International Conference on Microelectronic Test Structures, 2002. ICMTS 2002. Pub Date : 2002-04-08 DOI:10.1109/ICMTS.2002.1193200

H. P. Tuinhout, G. Hoogzaad, M. Vertregt, R. Roovers, C. Erdmann

{"title":"高精度电阻梯式测试结构的设计与表征","authors":"H. P. Tuinhout, G. Hoogzaad, M. Vertregt, R. Roovers, C. Erdmann","doi":"10.1109/ICMTS.2002.1193200","DOIUrl":null,"url":null,"abstract":"A new sub-site stepped multi-resistor test structure for characterising small resistance mismatch effects in resistor ladders is introduced. Using a Kelvin measurement method and a statistical data evaluation technique, this approach enables identification of very small (<0.05%) systematic mismatch patterns, which are associated with local mechanical stress as well as nanometre scale mask writing artifacts.","PeriodicalId":188074,"journal":{"name":"Proceedings of the 2002 International Conference on Microelectronic Test Structures, 2002. ICMTS 2002.","volume":"29 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2002-04-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"20","resultStr":"{\"title\":\"Design and characterisation of a high precision resistor ladder test structure\",\"authors\":\"H. P. Tuinhout, G. Hoogzaad, M. Vertregt, R. Roovers, C. Erdmann\",\"doi\":\"10.1109/ICMTS.2002.1193200\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A new sub-site stepped multi-resistor test structure for characterising small resistance mismatch effects in resistor ladders is introduced. Using a Kelvin measurement method and a statistical data evaluation technique, this approach enables identification of very small (<0.05%) systematic mismatch patterns, which are associated with local mechanical stress as well as nanometre scale mask writing artifacts.\",\"PeriodicalId\":188074,\"journal\":{\"name\":\"Proceedings of the 2002 International Conference on Microelectronic Test Structures, 2002. ICMTS 2002.\",\"volume\":\"29 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2002-04-08\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"20\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of the 2002 International Conference on Microelectronic Test Structures, 2002. ICMTS 2002.\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICMTS.2002.1193200\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the 2002 International Conference on Microelectronic Test Structures, 2002. ICMTS 2002.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICMTS.2002.1193200","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 20

摘要

介绍了一种新的分站阶梯式多电阻测试结构，用于测试电阻阶梯中的小电阻失配效应。使用开尔文测量法和统计数据评估技术，该方法能够识别非常小(<0.05%)的系统错配模式，这些模式与局部机械应力和纳米尺度掩模书写伪像有关。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

查看原文本刊更多论文

Design and characterisation of a high precision resistor ladder test structure

A new sub-site stepped multi-resistor test structure for characterising small resistance mismatch effects in resistor ladders is introduced. Using a Kelvin measurement method and a statistical data evaluation technique, this approach enables identification of very small (<0.05%) systematic mismatch patterns, which are associated with local mechanical stress as well as nanometre scale mask writing artifacts.

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

Proceedings of the 2002 International Conference on Microelectronic Test Structures, 2002. ICMTS 2002.

自引率

0.00%

发文量