{"title":"光刻-“他使用的技术是????”","authors":"R. Hill","doi":"10.1364/sxray.1992.ma2","DOIUrl":null,"url":null,"abstract":"There is great indecision in the semiconductor industry as to what the lithography technology will be for the back half of the 1990's (1995-2000). When applied against an idealized process requirements model, all technologies have problems which make the choice extremely expensive and difficult. Technologies considered are: optical extensions, e beam technologies, ion beam technologies, and x-ray technologies. This paper discusses the main technologies with a description of the advantages and disadvantages.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"48 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Lithography - \\\"The technology to he used is ????\\\"\",\"authors\":\"R. Hill\",\"doi\":\"10.1364/sxray.1992.ma2\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"There is great indecision in the semiconductor industry as to what the lithography technology will be for the back half of the 1990's (1995-2000). When applied against an idealized process requirements model, all technologies have problems which make the choice extremely expensive and difficult. Technologies considered are: optical extensions, e beam technologies, ion beam technologies, and x-ray technologies. This paper discusses the main technologies with a description of the advantages and disadvantages.\",\"PeriodicalId\":409291,\"journal\":{\"name\":\"Soft-X-Ray Projection Lithography\",\"volume\":\"48 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Soft-X-Ray Projection Lithography\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1364/sxray.1992.ma2\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Soft-X-Ray Projection Lithography","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/sxray.1992.ma2","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
There is great indecision in the semiconductor industry as to what the lithography technology will be for the back half of the 1990's (1995-2000). When applied against an idealized process requirements model, all technologies have problems which make the choice extremely expensive and difficult. Technologies considered are: optical extensions, e beam technologies, ion beam technologies, and x-ray technologies. This paper discusses the main technologies with a description of the advantages and disadvantages.
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