外接铁电电容器的MOSFET内电位不稳定性与60mv /dec亚阈值摆幅的直接关系

Xiuyan Li, A. Toriumi
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引用次数: 8

摘要

近年来,人们从负电容效应的角度对铁电场效应管中的陡阈下摆幅(SS)进行了深入的讨论,但仍存在争议。本文通过系统的实验证明了在直流模式下外接FE电容的MOSFET中,低于60 mV/dec的SS与内部电位$(V_{int})$增强之间的直接关系。结果表明,$V_{int}$增强只发生在一个有限的电压窗内,并且通过调整准电容可以实现无迟滞的陡坡SS。目前的结果支持目前报道的陡SS值与矫顽力场周围的FE畴切换密切相关,而不是理想的NC效应。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Direct relationship between sub-60 mV/dec subthreshold swing and internal potential instability in MOSFET externally connected to ferroelectric capacitor
Steep subthreshold swing (SS) in ferroelectric (FE) FETs have been intensively discussed these years in terms of the negative capacitance(NC) effect, but still under debate. This paper demonstrates the direct correlation between sub-60 mV/dec SS and internal potential $(V_{int})$ enhancement in MOSFET externally connected to FE capacitor in DC mode through systematic experiments. It is shown that $V_{int}$ enhancement only occurs in a limited voltage window, and that hysteresis-free steep SS is achievable by tuning the paraelectric capacitance. The present results support that the steep SS values so far reported are tightly related to FE domain switching around the coercive field rather than the ideal NC effect.
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