David Gehlhausen, S. Menezes, Lichuan Chen, Gyu-ho Kim, Hongbing Lu, Jinming Gao, Walter Hu
{"title":"采用压电喷射抗蚀剂的喷射可滚压纳米压印技术","authors":"David Gehlhausen, S. Menezes, Lichuan Chen, Gyu-ho Kim, Hongbing Lu, Jinming Gao, Walter Hu","doi":"10.1109/NANO.2013.6720909","DOIUrl":null,"url":null,"abstract":"We report an jet rollable nanoimprint lithography tool as a low cost method to produce micro- and nano-structures rapidly over large areas. We integrated a piezoelectric nozzle to deposit resist in-line in a low-waste, high-precision manner. We demonstrate the capabilities of this system by creating a variety of microstructures in SU8 resist with high pattern transfer fidelity.","PeriodicalId":189707,"journal":{"name":"2013 13th IEEE International Conference on Nanotechnology (IEEE-NANO 2013)","volume":"47 31 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2013-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Jet rollable nanoimprint lithography with piezoelectric jetting of resist\",\"authors\":\"David Gehlhausen, S. Menezes, Lichuan Chen, Gyu-ho Kim, Hongbing Lu, Jinming Gao, Walter Hu\",\"doi\":\"10.1109/NANO.2013.6720909\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We report an jet rollable nanoimprint lithography tool as a low cost method to produce micro- and nano-structures rapidly over large areas. We integrated a piezoelectric nozzle to deposit resist in-line in a low-waste, high-precision manner. We demonstrate the capabilities of this system by creating a variety of microstructures in SU8 resist with high pattern transfer fidelity.\",\"PeriodicalId\":189707,\"journal\":{\"name\":\"2013 13th IEEE International Conference on Nanotechnology (IEEE-NANO 2013)\",\"volume\":\"47 31 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2013-08-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2013 13th IEEE International Conference on Nanotechnology (IEEE-NANO 2013)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/NANO.2013.6720909\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2013 13th IEEE International Conference on Nanotechnology (IEEE-NANO 2013)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/NANO.2013.6720909","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Jet rollable nanoimprint lithography with piezoelectric jetting of resist
We report an jet rollable nanoimprint lithography tool as a low cost method to produce micro- and nano-structures rapidly over large areas. We integrated a piezoelectric nozzle to deposit resist in-line in a low-waste, high-precision manner. We demonstrate the capabilities of this system by creating a variety of microstructures in SU8 resist with high pattern transfer fidelity.