{"title":"利用聚焦离子束硬掩模制备新型金刚石波导","authors":"W. McKenzie, M. Hiscocks, F. Ladouceur","doi":"10.1109/ACOFT.2010.5929925","DOIUrl":null,"url":null,"abstract":"The Focused ion beam has been used to direct write a hard mask against the plasma etching of diamond. Nano-waveguides were fabricated from diamond-on-silica thin films close to ideal dimensions predicted via FIMMWAVE simulations.","PeriodicalId":338472,"journal":{"name":"35th Australian Conference on Optical Fibre Technology","volume":"63 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2010-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Fabricating novel diamond waveguides using the focused ion beam hard mask\",\"authors\":\"W. McKenzie, M. Hiscocks, F. Ladouceur\",\"doi\":\"10.1109/ACOFT.2010.5929925\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The Focused ion beam has been used to direct write a hard mask against the plasma etching of diamond. Nano-waveguides were fabricated from diamond-on-silica thin films close to ideal dimensions predicted via FIMMWAVE simulations.\",\"PeriodicalId\":338472,\"journal\":{\"name\":\"35th Australian Conference on Optical Fibre Technology\",\"volume\":\"63 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2010-12-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"35th Australian Conference on Optical Fibre Technology\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ACOFT.2010.5929925\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"35th Australian Conference on Optical Fibre Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ACOFT.2010.5929925","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Fabricating novel diamond waveguides using the focused ion beam hard mask
The Focused ion beam has been used to direct write a hard mask against the plasma etching of diamond. Nano-waveguides were fabricated from diamond-on-silica thin films close to ideal dimensions predicted via FIMMWAVE simulations.