{"title":"超深亚微米CMOS数字设计的扩展sakurai - newton MOSFET模型","authors":"N. Chandra, Apoorva Kumar Yati, A. Bhattacharyya","doi":"10.1109/VLSI.Design.2009.48","DOIUrl":null,"url":null,"abstract":"In this paper an extension of the Sakurai and Newton's Nth power law model, namely Extended-Sakurai-Newton Model, is proposed. The proposed model (henceforth referred to as the ESN model) preserves the simplicity and accuracy of the Sakurai Newton model for the estimation of drain current in deep submicron CMOS devices and extends it for varying device widths. Although the Modified Sakurai-Newton Current Model (MSN Model) also provides an estimation of transistor drain current with varying transistor widths, it suffers from the drawback of being more error prone and computation intensive in parameter extraction. The proposed model matches with BSIM3v3 level 49 T-SPICE simulations to within an error of 1.8%(3.67% maximum), in 0.18µm and 0.25µm CMOS processes for a wide range of transistor widths and input rise/fall times. The proposed model is further used to improve the Elmore Delay prediction of CMOS inverter operated at low supply voltages. The centroid-of-current and power based delay metrics [1] are modified based on the proposed model. The new delay metric is able to accurately predict the delay of CMOS inverter operated at low supply voltages. The proposed ESN Model is also applied to predict the delay of two-input CMOS NAND gate. Hence the proposed model can be effectively used in the design of digital CMOS gates involving varying device widths and supply voltages in the deep submicron region.","PeriodicalId":267121,"journal":{"name":"2009 22nd International Conference on VLSI Design","volume":"5 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2009-01-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"19","resultStr":"{\"title\":\"Extended-Sakurai-Newton MOSFET Model for Ultra-Deep-Submicrometer CMOS Digital Design\",\"authors\":\"N. Chandra, Apoorva Kumar Yati, A. Bhattacharyya\",\"doi\":\"10.1109/VLSI.Design.2009.48\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper an extension of the Sakurai and Newton's Nth power law model, namely Extended-Sakurai-Newton Model, is proposed. The proposed model (henceforth referred to as the ESN model) preserves the simplicity and accuracy of the Sakurai Newton model for the estimation of drain current in deep submicron CMOS devices and extends it for varying device widths. Although the Modified Sakurai-Newton Current Model (MSN Model) also provides an estimation of transistor drain current with varying transistor widths, it suffers from the drawback of being more error prone and computation intensive in parameter extraction. The proposed model matches with BSIM3v3 level 49 T-SPICE simulations to within an error of 1.8%(3.67% maximum), in 0.18µm and 0.25µm CMOS processes for a wide range of transistor widths and input rise/fall times. The proposed model is further used to improve the Elmore Delay prediction of CMOS inverter operated at low supply voltages. The centroid-of-current and power based delay metrics [1] are modified based on the proposed model. The new delay metric is able to accurately predict the delay of CMOS inverter operated at low supply voltages. The proposed ESN Model is also applied to predict the delay of two-input CMOS NAND gate. Hence the proposed model can be effectively used in the design of digital CMOS gates involving varying device widths and supply voltages in the deep submicron region.\",\"PeriodicalId\":267121,\"journal\":{\"name\":\"2009 22nd International Conference on VLSI Design\",\"volume\":\"5 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2009-01-05\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"19\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2009 22nd International Conference on VLSI Design\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/VLSI.Design.2009.48\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2009 22nd International Conference on VLSI Design","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VLSI.Design.2009.48","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Extended-Sakurai-Newton MOSFET Model for Ultra-Deep-Submicrometer CMOS Digital Design
In this paper an extension of the Sakurai and Newton's Nth power law model, namely Extended-Sakurai-Newton Model, is proposed. The proposed model (henceforth referred to as the ESN model) preserves the simplicity and accuracy of the Sakurai Newton model for the estimation of drain current in deep submicron CMOS devices and extends it for varying device widths. Although the Modified Sakurai-Newton Current Model (MSN Model) also provides an estimation of transistor drain current with varying transistor widths, it suffers from the drawback of being more error prone and computation intensive in parameter extraction. The proposed model matches with BSIM3v3 level 49 T-SPICE simulations to within an error of 1.8%(3.67% maximum), in 0.18µm and 0.25µm CMOS processes for a wide range of transistor widths and input rise/fall times. The proposed model is further used to improve the Elmore Delay prediction of CMOS inverter operated at low supply voltages. The centroid-of-current and power based delay metrics [1] are modified based on the proposed model. The new delay metric is able to accurately predict the delay of CMOS inverter operated at low supply voltages. The proposed ESN Model is also applied to predict the delay of two-input CMOS NAND gate. Hence the proposed model can be effectively used in the design of digital CMOS gates involving varying device widths and supply voltages in the deep submicron region.