H. Nakai, K. Kanazawa, M. Asano, I. Sato, H. Iwahashi, K. Sakai, M. Yahata, S. Tanaka, N. Tozawa, M. Yatabe, S. Saito
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引用次数: 0
摘要
采用独特的高速伪差分传感技术和新的抗噪技术,研制了一种36ns, 1mb的EPROM。为了实现高速度和小芯片尺寸,采用单端位线(一个晶体管/单元)和两个参考位线的伪差分传感技术取代了传统的全差分传感技术,该技术具有芯片尺寸大的缺点。利用地址转换检测脉冲控制数据传输速度的新型数据传输电路,对输出电容充放电产生的电力线噪声具有较高的抗扰性。采用0.9 μ m光刻技术,实现了3.1 μ m × 2.9 μ m的晶片尺寸,从而实现了6.67 mm × 6.56 mm的小晶片尺寸。该芯片采用n阱CMOS双多晶硅工艺,采用多晶技术和单一金属制造
A 36 ns 1 Mbit CMOS EPROM with new data sensing technique
A 36-ns, 1-Mb EPROM using a unique pseudodifferential sensing technique for high speed and a new noise immunity technique has been developed. In order to achieve both high speed and small die size, a newly developed pseudodifferential sensing technique with single-ended bit lines (one transistor/cell) and only two reference bit lines has been implemented, instead of a conventional fully differential sensing technique which has the disadvantage of large die size. A new data transfer circuit whose data transfer speed is controlled by an address transition detection pulse is utilized to obtain high noise immunity against power line noise caused by charging or discharging an output capacitance. Using 0.9-μm lithography, a cell size of 3.1 μm×2.9 μm has been achieved, resulting in a small die size of 6.67 mm×6.56 mm. The chip is fabricated by an n-well CMOS double poly-Si process with polycide technology and a single metal