金属有机化学气相沉积法优化p型砷化镓纳米线生长

Ran Li, Hui Huang, X. Ren, Jing-Wei Guo, Xiaolong Liu, Yongqing Huang, Shiwei Cai
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引用次数: 0

摘要

采用金属-有机化学气相沉积的方法,在GaAs (111) B衬底上生长了具有纯锌矿结构的垂直p型砷化镓(GaAs)纳米线。采用外加二乙基锌(DEZn)对p型掺杂进行了研究。在高II/III比率范围内(II/II>9.1%),存在一个临界长度,超过该长度就会发生扭结。讨论了两个可能的原因。通过能量色散x射线(EDX)分析证实了锌在纳米线中的存在。对应于II/III=0.2%,掺杂浓度约为8×1018。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Optimization growth of P-type GaAs nanowires by metal-organic chemical vapor deposition
Vertical p-type Gallium arsenide (GaAs) nanowires with pure zinc blende structure were grown on GaAs (111) B substrate by metal-organic chemical vapor deposition via Au-catalyst vapor-liquid-solid mechanism. The p-type doping was investigated by additional diethyl zinc (DEZn). In high II/III ratio range (II/II>9.1%), there exists a critical length, beyond which the kinking takes place. Two possible reasons were discussed.Zn occurrence into the nanowires was verified by energy dispersive X-ray (EDX) analysis. Corresponding to II/III=0.2%, the doping concentration is about 8×1018.
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