嵌入放大尺寸量子点的高q半导体微柱

A. Loffler, J. Reithmaier, G. Sȩk, C. Hofmann, S. Reitienstein, M. Kamp, A. Forchel
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引用次数: 0

摘要

基于高反射率分布Bragg反射器,在1 /spl λ /-腔内实现了具有新型GaInAs量子点的垂直发射as /GaAs微腔柱。由于改进了制造技术,获得了高质量的因子。采用低应变的Ga/sub 0.70/In/sub 0.30/As成核层,可将点形尺寸增大一个数量级。在4 /spl mu/m宽的微腔中,提出了质量系数最高可达27700的微柱。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
High-Q semiconductor micropillars with embedded quantum dots of enlarged dimensions
Vertical emitting AlAs/GaAs microcavity pillars with a new type of GaInAs quantum dots within a one /spl lambda/-cavity have been realised based on high reflectivity distributed Bragg reflectors. High quality factors were achieved due to an improved fabrication technology. The dot dimensions could be enlarged by one order of magnitude using a low strain Ga/sub 0.70/In/sub 0.30/As nucleation layer. In this paper, micropillars with a maximum quality factor of up to 27700 for a 4 /spl mu/m wide microcavity was presented.
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