基于尾态指数分布的纳米晶硅薄膜晶体管漏极电流模型

P. Sharma, N. Gupta
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引用次数: 0

摘要

本文根据纳米晶硅薄膜晶体管(nc-Si TFT)尾态的指数分布,建立了漏极电流的模型。由于声子和界面粗糙度的存在,迁移率的退化被考虑在内。在宽高比(W/L= 400 μm / 20 μm)和宽高比(W/L= 400 μm / 8 μm)两种情况下,对所建立的模型进行了仿真,得到的曲线形状与验证模型的实验曲线相似。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Model for drain current based on the exponential distribution of tail states for nanocrystalline silicon thin film transistor
In this paper we have modeled the drain current based on the exponential distribution of tail states for nanocrystalline silicon thin film transistor (nc-Si TFT). The degradation of mobility due to the presence of acoustic phonons and interface roughness are taken into account. The model thus developed has been simulated for two different aspect ratios (W/L= 400 μm / 20 μm and W/L = 400 μm / 8 μm), the shape of the curves obtained are similar to the experimental ones validating the developed model.
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