多层周期均匀性和软x射线成像系统的性能

J. Kortright, R. Watts
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引用次数: 0

摘要

由于多层x射线结构是带通反射器,近正入射软x射线聚焦光学器件表面多层周期的变化对成像系统的性能有影响。我们已经研究了这些问题,因为它们与施瓦西物镜有关,这些物镜涂有Mo/Si多层膜,用于波长范围从大约12.4到21.0 nm。结果可以推广到其他类型的复合反射成像或投影系统和波长范围。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Multilayer Period Uniformity and Performance of Soft X-ray Imaging Systems
Because multilayer x-ray structures are bandpass reflectors, the variation in multilayer period across the surfaces of near normal-incidence soft x-ray focussing optics has implications for performance of imaging systems. We have investigated these issues as they relate to Schwarzschild objectives coated with Mo/Si multilayers for use at wavelengths ranging from roughly 12.4 to 21.0 nm. The results can be generalized to other types of compound reflective imaging or projection systems and wavelength ranges.
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