基于PSpice模型和加速试验的830nm激光二极管降解研究

Peng Yang, Guishan Wang, Weiguo Wu, J. Qiu
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引用次数: 0

摘要

通过PSpice模型仿真和加速降解试验,研究了830 nm同轴双异质结激光二极管(DHLD)的降解特征和降解趋势。揭示了温升、降解模式和特征之间的关系。首先分析了活性区缺陷生长(ARDG)和空腔表面氧化(CSO)的机理,揭示了温度升高与CSO之间的因果关系。然后,利用PSpice软件构建LD等效电路模型,仿真结果表明,ARDG会使P(I)曲线的阈值电流增大,而CSO会使斜率减小。最后搭建了加速降解实验平台,并在Sharp的830 nm LD上进行了加速降解实验。实验结果表明,温度升高会导致CSO的劣化,但对ARDG没有显著影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Degradation Study of 830nm Laser Diodes Based on PSpice Model and Accelerated Tests
The signatures and trend of degradation of 830 nm coaxial double heterojunction laser diode (DHLD) are studied by PSpice model simulation and accelerated degradation test. The relationships among temperature rise, degradation modes and signatures are revealed. Firstly, the mechanism of active region defect growth (ARDG) and cavity surface oxidation (CSO) are analyzed, and the causal relationship between temperature rise and CSO is revealed. Then, an equivalent circuit model of LD is constructed by PSpice software, and the simulation results show that the ARDG will cause the threshold current of P(I) curve to increase and the CSO will cause the slope to decrease. Finally, an accelerated degradation experimental platform is constructed, and the accelerated degradation tests are carried out on Sharp's 830 nm LD. The experimental results show that the temperature rise will cause the deterioration of CSO, but has no significant effect on ARDG.
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