E. Randel, A. Davenport, A. Markosyan, R. Bassiri, M. Fejer, C. Menoni
{"title":"超低应力SiO2离子束沉积涂层","authors":"E. Randel, A. Davenport, A. Markosyan, R. Bassiri, M. Fejer, C. Menoni","doi":"10.1364/OIC.2019.WC.5","DOIUrl":null,"url":null,"abstract":"Ion beam sputtered films typically have high compressive stress. By using high energy primary ions to sputter a SiO2 target and high energy ions from an assist source with an O2 plasma the compressive stress of SiO2 can be significantly reduced down to 62MPa.","PeriodicalId":119323,"journal":{"name":"Optical Interference Coatings Conference (OIC) 2019","volume":"26 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-06-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Ultra-low Stress SiO2 Ion Beam Deposition Coatings\",\"authors\":\"E. Randel, A. Davenport, A. Markosyan, R. Bassiri, M. Fejer, C. Menoni\",\"doi\":\"10.1364/OIC.2019.WC.5\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Ion beam sputtered films typically have high compressive stress. By using high energy primary ions to sputter a SiO2 target and high energy ions from an assist source with an O2 plasma the compressive stress of SiO2 can be significantly reduced down to 62MPa.\",\"PeriodicalId\":119323,\"journal\":{\"name\":\"Optical Interference Coatings Conference (OIC) 2019\",\"volume\":\"26 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2019-06-02\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Optical Interference Coatings Conference (OIC) 2019\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1364/OIC.2019.WC.5\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optical Interference Coatings Conference (OIC) 2019","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/OIC.2019.WC.5","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Ultra-low Stress SiO2 Ion Beam Deposition Coatings
Ion beam sputtered films typically have high compressive stress. By using high energy primary ions to sputter a SiO2 target and high energy ions from an assist source with an O2 plasma the compressive stress of SiO2 can be significantly reduced down to 62MPa.
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