{"title":"一步离子束刻蚀和质量输运平滑的大数值孔径微透镜","authors":"Z. Liau, D. Mull, C. L. Dennis, B.G. Waarts","doi":"10.1109/LEOS.1992.694165","DOIUrl":null,"url":null,"abstract":"Mesa structures with designed width variations have been etched in compound semiconductor substrates and subsequently transformed into microlenses by heat treatment. These highly accurate elements are very promising for eff icient diffraction-limited microoptical applications and monolithic optoelectronic integration.","PeriodicalId":331211,"journal":{"name":"LEOS '92 Conference Proceedings","volume":"94 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1992-11-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Large-numerical-aperture Microlenses By One-step Ion-beam Etching And Mass-transport Smoothing\",\"authors\":\"Z. Liau, D. Mull, C. L. Dennis, B.G. Waarts\",\"doi\":\"10.1109/LEOS.1992.694165\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Mesa structures with designed width variations have been etched in compound semiconductor substrates and subsequently transformed into microlenses by heat treatment. These highly accurate elements are very promising for eff icient diffraction-limited microoptical applications and monolithic optoelectronic integration.\",\"PeriodicalId\":331211,\"journal\":{\"name\":\"LEOS '92 Conference Proceedings\",\"volume\":\"94 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1992-11-16\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"LEOS '92 Conference Proceedings\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/LEOS.1992.694165\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"LEOS '92 Conference Proceedings","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/LEOS.1992.694165","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Large-numerical-aperture Microlenses By One-step Ion-beam Etching And Mass-transport Smoothing
Mesa structures with designed width variations have been etched in compound semiconductor substrates and subsequently transformed into microlenses by heat treatment. These highly accurate elements are very promising for eff icient diffraction-limited microoptical applications and monolithic optoelectronic integration.
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